CrAl Alloy Targets processing
| tem | Cr-Al Target |
| Manufacturing Process | Hot Isostatic Pessing |
| Specification | Maximum 1200*250mm;
Or as customers’ requirements . |
| Relative Density | >99.0% |
| Purity | 99.5%~99.95%(2N5~3N5) |
| Grain Size | <100μm |
| Typical Products | Cr-70Al,Cr-50Al,Cr-30Al(at%) |
Description
Aluminum-Alloy Sputtering Target enhance the toughness and resistance to oxidation of the nitride coatings of drills, milling machines, indexable cutting inserts and other tools.
Elevate Your Coating Processes with Precision: Alloy Sputtering Targets for Superior Vacuum Coating. Discover Quality in CrAl and Nickel Chromium Aluminum Targets.
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